Quencher Effects at 22 nm Pattern Formation in Chemically...

Japanese Journal of Applied Physics 2008 / 7 Vol. 47; Iss. 7

Quencher Effects at 22 nm Pattern Formation in Chemically Amplified Resists

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Itani, Toshiro
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Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.5404
Date:
July, 2008
File:
PDF, 376 KB
english, 2008
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