![](/img/cover-not-exists.png)
Low-Temperature Deposition of Silicon Oxide Film from the Reaction of Silicone Oil Vapor and Ozone Gas
Horita, Susumu, Toriyabe, Koichi, Nishioka, KensukeVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.035502
Date:
March, 2009
File:
PDF, 520 KB
english, 2009