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Optimum Dissolution Point of Chemically Amplified Resists in Terms of Trade-Off Relationships between Resolution, Line Edge Roughness, and Sensitivity
Kozawa, Takahiro, Yamamoto, Hiroki, Tagawa, SeiichiVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.026502
Date:
February, 2011
File:
PDF, 507 KB
english, 2011