Reactive Sputter Deposition of SiO$_{x}$N$_{y}$ Films under...

Japanese Journal of Applied Physics 2011 / 8 Vol. 50; Iss. 8

Reactive Sputter Deposition of SiO$_{x}$N$_{y}$ Films under Ar–CO$_{2}$–N$_{2}$ Atmosphere

Ashida, Toru, Omoto, Hideo, Tomioka, Takao, Takamatsu, Atsushi
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.08KE03
Date:
August, 2011
File:
PDF, 362 KB
english, 2011
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