Suppression of Leakage Current of Metal–Insulator–Semiconductor Ta$_{2}$O$_{5}$ Capacitors with Al$_{2}$O$_{3}$/SiON Buffer Layer
Tonomura, Osamu, Miki, Hiroshi, Takeda, Ken-ichiVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.101501
Date:
October, 2011
File:
PDF, 543 KB
english, 2011