Surface Relief Formation in Azobenzene-Containing Polymers...

Japanese Journal of Applied Physics 2012 / 1 Vol. 51

Surface Relief Formation in Azobenzene-Containing Polymers Using 325 nm Holography

Nishioka, Emi, Kondo, Mizuho, Emoto, Akira, Ono, Hiroshi, Kawatsuki, Nobuhiro
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Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.021601
Date:
January, 2012
File:
PDF, 1.24 MB
english, 2012
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