Multiscale modeling of anisotropic wet chemical etching of crystalline silicon
Gosálvez, M. A, Foster, A. S, Nieminen, R. MVolume:
60
Language:
english
Journal:
Europhysics Letters (EPL)
DOI:
10.1209/epl/i2002-00287-1
Date:
November, 2002
File:
PDF, 403 KB
english, 2002