Passivation of 4H-SiC/SiO2 Interface Traps by Oxidation of a Thin Silicon Nitride Layer
Mikhaylov, A.I., Afanasyev, Alexey V., Luchinin, Victor V., Reshanov, S.A., Schöner, Adolf, Knoll, Lars, Minamisawa, Renato Amaral, Alfieri, Giovanni, Bartolf, HolgerVolume:
821-823
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.821-823.508
Date:
June, 2015
File:
PDF, 453 KB
english, 2015