S i O 2...

Japanese Journal of Applied Physics 1995 / 12 Vol. 34; Iss. 12S

S i O 2 / P o l y - S i Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions

Wada, Toshimi, Hirayama, Motoki, Haraichi, Satoshi, Ishii, Ken'ichi, Hiroshima, Hiroshi, Masanori Komuro, Masanori Komuro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.34.6961
Date:
December, 1995
File:
PDF, 135 KB
english, 1995
Conversion to is in progress
Conversion to is failed