Actinometric study on SiO 2...

Plasma Sources Science and Technology 1992 / 08 Vol. 1; Iss. 3

Actinometric study on SiO 2 etching by a dual-frequency magnetic triode reactor

Pische, V, Peccoud, L, Lassagne, P
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Volume:
1
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/1/3/002
Date:
August, 1992
File:
PDF, 352 KB
english, 1992
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