Coulomb Blockade Phenomena in Si Metal-Oxide-Semiconductor...

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Coulomb Blockade Phenomena in Si Metal-Oxide-Semiconductor Field-Effect Transistors with Nano-Scale Channels Fabricated Using Focused-Ion Beam Implantation

H. Kondo, K. Izumikawa, M. Sakurai, S. Baba, H. Iwano, S. Zaima, Y. Yasuda
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Year:
1999
Language:
english
DOI:
10.1143/JJAP.38.7222
File:
PDF, 233 KB
english, 1999
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