![](/img/cover-not-exists.png)
A New Fabrication Technology for Field-Emission Triodes with Emitter-Gate Separation of 0.18 µ m
Wang, Chih-Chong, Lee, Wen-Fang, Ku, Tze-Kun, Chen, Ming-Shang, Feng, Ming-Shiann, Hsieh, Iing-Jar, Huang-Chung Cheng, Huang-Chung ChengVolume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.34.L85
Date:
January, 1995
File:
PDF, 243 KB
english, 1995