Investigation of pulsed lasing due to a 472.2-nm...

Investigation of pulsed lasing due to a 472.2-nm self-terminating transition in the bismuth atom at low buffer gas pressures

Vokhmin, P A, Zapesochnyĭ, I P, Kel'man, V A, Shpenik, Yu O
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
17
Language:
english
Journal:
Soviet Journal of Quantum Electronics
DOI:
10.1070/QE1987v017n08ABEH009644
Date:
August, 1987
File:
PDF, 711 KB
english, 1987
Conversion to is in progress
Conversion to is failed