Vacancy engineering by He induced nanovoids in crystalline Si
Kilpeläinen, S, Kuitunen, K, Tuomisto, F, Slotte, J, Bruno, E, Mirabella, S, Priolo, FVolume:
24
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/24/1/015005
Date:
January, 2009
File:
PDF, 124 KB
english, 2009