Oxygen quenching effect in ultra-deep x-ray lithography with SU-8 resist
Shew, Bor-Yuan, Huang, Tai-Yuan, Liu, Kun-Pei, Chou, Chang-PinVolume:
14
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/14/3/014
Date:
March, 2004
File:
PDF, 201 KB
english, 2004