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SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II - Rapid x-ray reflectivity (XRR) characterization and process monitoring of multilayer Ta/Al2O3/Ta/SiO2/Si
Leng, JingMin, Opsal, Jon L., Duparre, Angela, Singh, BhanwarVolume:
4449
Year:
2001
Language:
english
DOI:
10.1117/12.450101
File:
PDF, 228 KB
english, 2001