Microwave Plasma CVD System to Fabricate α-Si Thin Films...

Japanese Journal of Applied Physics 1983 / 1 Vol. 22; Iss. Part 2, No

Microwave Plasma CVD System to Fabricate α-Si Thin Films out of Plasma

Kato, Isamu, Wakana, Shin-ichi, Hara, Shinji
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Volume:
22
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.L40
Date:
January, 1983
File:
PDF, 453 KB
1983
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