Lateral Solid-Phase Epitaxy of Vacuum-Deposited Amorphous Si Film over Recessed SiO 2 Patterns
Kunii, Yasuo, Tabe, MichiharuVolume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L352
Date:
May, 1985
File:
PDF, 248 KB
english, 1985