Silicon Selective Epitaxial Growth and Electrical Properties of Epi/Sidewall Interfaces
Ishitani, Akihiko, Kitajima, Hiroshi, Endo, Nobuhiro, Kasai, NaokiVolume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.841
Date:
May, 1989
File:
PDF, 530 KB
english, 1989