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DC Bias Method for a-Si:H Deposition on a Dielectric Substrate Using Electron Cyclotron Resonance Plasma
Nakayama, Yoshikazu, Kondoh, Mitsuru, Hitsuishi, Kohji, Kawamura, TakaoVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.1801
Date:
September, 1990
File:
PDF, 340 KB
1990