Photoluminescence of a-Si:H Films Prepared by Catalytic...

Japanese Journal of Applied Physics 1990 / 8 Vol. 29; Iss. Part 2, No

Photoluminescence of a-Si:H Films Prepared by Catalytic Chemical Vapor Deposition Method

Yamaguchi, Masaaki, Matsumura, Hideki, Morigaki, Kazuo
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Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1366
Date:
August, 1990
File:
PDF, 592 KB
english, 1990
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