Amorphous-Silicon Thin-Film Transistors Using Chemical...

Japanese Journal of Applied Physics 1990 / 10 Vol. 29; Iss. Part 2, No

Amorphous-Silicon Thin-Film Transistors Using Chemical Vapor Deposition of Disilane

Breddels, Paul A., Kanoh, Hiroshi, Sugiura, Osamu, Matsumura, Masakiyo
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Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1750
Date:
October, 1990
File:
PDF, 609 KB
english, 1990
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