Measurement of the Activation Energy of Tantalum Silicide Growth on Silicon by Rapid Electron Beam Annealing
Mahmood, F., Ahmed, H., Suleman, M., Ahmed, M. M.Volume:
30
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.L1418
Date:
August, 1991
File:
PDF, 393 KB
english, 1991