Preparation of Bismuth Silicate Films on Si Wafer by...

Japanese Journal of Applied Physics 1993 / 1 Vol. 32; Iss. Part 1, No

Preparation of Bismuth Silicate Films on Si Wafer by Metalorganic Chemical Vapor Deposition

Kim, Jonghee, Tsurumi, Takaaki, Hirano, Hideyuki, Kamiya, Toshio, Mizutani, Nobuyasu, Daimon, Masaki
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.135
Date:
January, 1993
File:
PDF, 1.04 MB
english, 1993
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