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Improved Registration Accuracy in E-Beam Direct Writing Lithography
Kojima, Yoshikatsu, Mukai, Hiroshi, Nakajima, Ken, Aizaki, NaoakiVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.6035
Date:
December, 1993
File:
PDF, 734 KB
english, 1993