Transport and Deposition Processes of Sputtered Particles...

Japanese Journal of Applied Physics 1994 / 7 Vol. 33; Iss. Part 1, No

Transport and Deposition Processes of Sputtered Particles in RF-Microwave Hybrid Sputtering Discharges

Tuda, Mutumi, Ono, Kouichi, Yuuki, Akimasa
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.4473
Date:
July, 1994
File:
PDF, 295 KB
english, 1994
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