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Quantized Conductance of a Silicon Wire Fabricated by Separation-by-Implanted-Oxygen Technology
Nakajima, Yasuyuki, Takahashi, Yasuo, Horiguchi, Seiji, Iwadate, Kazumi, Namatsu, Hideo, Kurihara, Kenji, Tabe, MichiharuVolume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.1309
Date:
February, 1995
File:
PDF, 281 KB
english, 1995