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Fabrication of Highly Stable and Low Defect Density Amorphous Silicon Films at Low Substrate Temperature by Plasma Chemical Vapor Deposition Assisted with Piezoelectric Vibration
Sumiya, Masatomo, Kawasaki, Masashi, Ko\vcka, Jan, HideomiKoinuma,Volume:
34
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.L97
Date:
January, 1995
File:
PDF, 647 KB
1995