Preparation and Electrical Properties of...

Japanese Journal of Applied Physics 1996 / 9 Vol. 35; Iss. Part 1, No

Preparation and Electrical Properties of S r T i O 3 Thin Films Deposited by Liquid Source Metal-Organic Chemical Vapor Deposition (MOCVD)

Kang, Chang Seok, Hwang, Cheol Seong, Cho, Hag-Ju, Lee, Byoung Taek, Park, Soon Oh, Kim, Jin Won, Horii, Hideki, Lee, Sang In, Koh, Young Bum, Lee, Moon Yong
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.4890
Date:
September, 1996
File:
PDF, 108 KB
english, 1996
Conversion to is in progress
Conversion to is failed