Chemical Vapor Deposition of Ru and Its Application in (Ba,Sr)TiO 3 Capacitors for Future Dynamic Random Access Memories
Aoyama, Tomonori, Kiyotoshi, Masahiro, Yamazaki, Soichi, Eguchi, KazuhiroVolume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.2194
Date:
April, 1999
File:
PDF, 377 KB
english, 1999