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Crystallization Process of TiNi Thin Films Sputtered at Elevated Temperatures on Pt/Si Oxide/Si and Si Oxide/Si Substrates
Kim, Ick-Jun, Nanjo, Hiroshi, Iijima, Takashi, Abe, ToshihikoVolume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.568
Date:
February, 2000
File:
PDF, 613 KB
english, 2000