A Dual BARC method for Lithography and Etch for Dual...

Japanese Journal of Applied Physics 2003 / 5 Vol. 42; Iss. Part 1, No

A Dual BARC method for Lithography and Etch for Dual Damascene with Low K

Roy, Moitreyee, Bliznetsov, Vladimir, Samudra, Ganesh
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.2649
Date:
May, 2003
File:
PDF, 242 KB
english, 2003
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