Estimation of Optimum Electron-Beam Projection Lithography...

Japanese Journal of Applied Physics 2003 / 6 Vol. 42; Iss. Part 1, No

Estimation of Optimum Electron-Beam Projection Lithography Mask Biases Taking Coulomb Beam Blur into Consideration

Kobinata, Hideo, Yamada, Yasuhisa, Tamura, Takao, Fujii, Kiyoshi, Narihiro, Mitsuru, Ochiai, Yukinori
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.3816
Date:
June, 2003
File:
PDF, 247 KB
english, 2003
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