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Comparative Studies of Perfluorocarbon Alternative Gas Plasmas for Contact Hole Etch
Nakamura, Shingo, Itano, Mitsushi, Aoyama, Hirokazu, Shibahara, Kentaro, Yokoyama, Shin, Hirose, MasatakaVolume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.5759
Date:
September, 2003
File:
PDF, 226 KB
english, 2003