Resistivity Measurements of Directly Bonded Si Wafers

Japanese Journal of Applied Physics 2004 / 10 Vol. 43; Iss. 10

Resistivity Measurements of Directly Bonded Si Wafers

Kanno, Ikuo, Nakayama, Atsushi, Nomiya, Seiichiro, Onabe, Hideaki
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Volume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.6996
Date:
October, 2004
File:
PDF, 317 KB
english, 2004
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