Reoxidation Behavior of High-Nitrogen Oxynitride Films...

Japanese Journal of Applied Physics 2005 / 5 Vol. 44; Iss. 5A

Reoxidation Behavior of High-Nitrogen Oxynitride Films after O 2 and N 2 O Treatment

Lin, Bo Chun, Chang, Kow Ming, Lai, Chiung Hui, Hsieh, Kuang Yeu, Yao, June Min
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2993
Date:
May, 2005
File:
PDF, 89 KB
english, 2005
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