Surface Texturing of Silicon by Hydrogen Radicals

Japanese Journal of Applied Physics 2005 / 11 Vol. 44; Iss. 11

Surface Texturing of Silicon by Hydrogen Radicals

Nagayoshi, Hiroshi, Konno, Keita, Nishimura, Suzuka, Terashima, Kazutaka
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Volume:
44
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.7839
Date:
November, 2005
File:
PDF, 367 KB
2005
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