Effect of Fluorine on Characteristics of Shallow Trench Isolation Prepared Using High-Density Plasma Chemical Vapor Deposition Including NF 3 Chemistry
Chung, Sung-Woong, Chung, Chai-O, Lee, Sang-Don, Sohn, Hyun-Chul, Kwon, Ho-Yup, Hong, Sung-JuVolume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.1575
Date:
March, 2006
File:
PDF, 245 KB
english, 2006