Growth Kinetics of Fe Films Electrodeposited on n-Si(111)

Japanese Journal of Applied Physics 2006 / 4 Vol. 45; Iss. 4A

Growth Kinetics of Fe Films Electrodeposited on n-Si(111)

Lee, Jong Duk, Kim, Kun Ho, Lee, Jeoung Ju, Jeong, Soon Young, Ahn, Byeong Yeol, Kim, Hyeon Soo, Shin, Yong Woon
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.2470
Date:
April, 2006
File:
PDF, 1.71 MB
english, 2006
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