Simulation of the Electrical Properties of SiH...

Japanese Journal of Applied Physics 2006 / 10 Vol. 45; Iss. 10B

Simulation of the Electrical Properties of SiH 4 /H 2 RF Discharges

Lyka, B., Amanatides, E., Mataras, D.
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.8172
Date:
October, 2006
File:
PDF, 361 KB
english, 2006
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