Impact of Physical Vapor Deposition-Based In situ Fabrication Method on Metal/High- k Gate Stacks
Watanabe, Heiji, Horie, Shinya, Minami, Takashi, Kitano, Naomu, Kosuda, Motomu, Shimura, Takayoshi, Yasutake, KiyoshiVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.1910
Date:
April, 2007
File:
PDF, 419 KB
english, 2007