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Modeling and Simulation of Arsenic-Doped-Silicon Low-Pressure Chemical Vapor Deposition
Kinoshita, Shigeru, Konno, Takuya, Takagi, Shigeyuki, Suzuki, Takashi, Maki, KunisukeVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.5095
Date:
August, 2007
File:
PDF, 241 KB
english, 2007