Analyses of Threshold Voltage Shift on Hole Injection in...

Japanese Journal of Applied Physics 2009 / 5 Vol. 48; Iss. 5

Analyses of Threshold Voltage Shift on Hole Injection in HfSiO x Films

Tamura, Chihiro, Hayashi, Tomohiro, Kikuchi, Yuuki, Ohmori, Kenji, Hasunuma, Ryu, Yamabe, Kikuo
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.05DD03
Date:
May, 2009
File:
PDF, 1.56 MB
english, 2009
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