Extreme Ultraviolet Resist Outgassing Quantification...

Japanese Journal of Applied Physics 2009 / 6 Vol. 48; Iss. 6

Extreme Ultraviolet Resist Outgassing Quantification Verification by Resist Film Analysis

Kobayashi, Shinji, Santillan, Julius Joseph, Oizumi, Hiroaki, Itani, Toshiro
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.06FC02
Date:
June, 2009
File:
PDF, 739 KB
english, 2009
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