The Effect of Thick Interconnections Formed by Gold Electroplating on the Characteristics of Metal–Oxide–Semiconductor Field-Effect Transistors
Shimoyama, Nobuhiro, Sato, Norio, Ishii, Hiromu, Kamei, Toshikazu, Kudou, Kazuhisa, Machida, Katsuyuki, Tsuchiya, ToshiakiVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.016501
Date:
January, 2010
File:
PDF, 289 KB
english, 2010