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Effects of Aspect Ratio of Photoresist Patterns on Adhesive Strength between Microsized SU-8 Columns and Silicon Substrate under Bend Loading Condition
Ishiyama, Chiemi, Shibata, Akinobu, Sone, Masato, Higo, YakichiVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.06GN14
Date:
June, 2010
File:
PDF, 223 KB
english, 2010