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Analysis of Plasma Wall Reactions Using Virtual Optical Emission Spectrometry Signal during Dielectric Etching
Kuboi, Nobuyuki, Fukasawa, Masanaga, Kawashima, Atsushi, Oshima, Keiji, Nagahata, Kazunori, Tatsumi, TetsuyaVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.08JD01
Date:
August, 2010
File:
PDF, 300 KB
english, 2010