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Surface Passivation of Crystalline Silicon by Combination of Amorphous Silicon Deposition with High-Pressure H$_{2}$O Vapor Heat Treatment
Sameshima, Toshiyuki, Nagao, Tomokazu, Hasumi, Masahiko, Shuku, Asuka, Takahashi, Eiji, Andoh, YasunoriVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.03CA06
Date:
March, 2012
File:
PDF, 312 KB
english, 2012