Stability of crystalline Gd 2...

Semiconductor Science and Technology 2008 / 03 Vol. 23; Iss. 3

Stability of crystalline Gd 2 O 3 thin films on silicon during rapid thermal annealing

Czernohorsky, M, Tetzlaff, D, Bugiel, E, Dargis, R, Osten, H J, Gottlob, H D B, Schmidt, M, Lemme, M C, Kurz, H
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Volume:
23
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/23/3/035010
Date:
March, 2008
File:
PDF, 275 KB
english, 2008
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