Impurity Effects in Chalcogenide Amorphous Semiconductors...

Japanese Journal of Applied Physics 1984 / 10 Vol. 23; Iss. Part 1, No

Impurity Effects in Chalcogenide Amorphous Semiconductors by Low-Temperature Diffusion of Metal Ions

Okano, Shuichi, Suzuki, Akio, Fukada, Noboru, Imura, Takeshi, Hiraki, Akio
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Volume:
23
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.1320
Date:
October, 1984
File:
PDF, 236 KB
english, 1984
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